[Chimera-users] Residue exposition cutoff

[Yasser Almeida Hernández]

Hi all....
I have 2 question, beyond Chimera's issues.

1 - There is some cutoff value to consider a residue or more strictly,  
an atom exposed to the solvent?.

2 - Could i set a this cutoff using the area values and types (SR0,  
SC0 and SS0) from the DMS program output?

3 - Wich program you recommend to compute SAS?

Thanks,
best regards

-- 
Yasser Almeida Hernández, BSc
Center of Molecular Inmunology (CIM)
Nanobiology Group
P.O.Box 16040, Havana, Cuba
Phone: (537) 214-3178
almeida at cim.sld.cu

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